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With the continuous improvement of laser performance, PLD technology is the most widely used in the preparation of various thin films, which can be used to prepare metals, semiconductors, oxides, nitrides, carbides, borides, silicides, sulfides and fluorides. It is also used to prepare films of various materials that are difficult to synthesize, such as diamond, cubic nitride film, etc., and has achieved great success.
working principle:
In the film forming cavity, a strong pulsed laser is concentrated by a lens into a small spot, which is hit on the target material, and the target material irradiated by the laser spot is instantaneously vaporized and ionized to form a mass of plasma. External ejection to deposit a film on the substrate.
System Components:
(1) Excimer laser (2), PLD deposition system
Project Introduction: